Personnel Selection and Training
Normal manufacturing produces products with a yield that approaches 100%. The products that are made can operate with some manufacturing debris and contamination deposited within the product, but these materials do not seriously affect the quality of the product. The requirements of the product types produced in most cleanrooms are significantly different. The cleanroom products are usually high-technology objects that are affected by even the smallest particulate contaminants that deposit upon the product. Scores of such products require cleanroom fabrication. They vary in dimensions from 80-μm laser fusion targets to aerospace devices many meters long. Many cleanroom products are produced with yields that are much less than those in normal fabrication processes. In some semiconductor areas, acceptable yield is less than 25%. The cost of repairing a semiconductor chip with short circuits or open circuits is very high. In many situations, a contaminated product cannot be repaired or recovered for use. The critical products cannot be contaminated during the fabrication process.
KeywordsClean Room Semiconductor Manufacturing Clean Area Clean Glove Work Habit
Unable to display preview. Download preview PDF.
- DeLuca, P. P., 1983. Microcontamination Control: A Summary of an Approach to Training. Journal of Parenteral Science and Technology 37(6):218–224.Google Scholar
- Gutacker, A. R., 1988. Personnel Training in Contamination Control Technology. Proceedings of the 9th International Committee of Contamination Control Societies Conference, pp. 247–253, September 26, 1988, Los Angeles.Google Scholar
- Larrabee, G. B., 1985. A Challenge to Chemical Engineers: Microelectronics. Chemical Engineering 92(12):51–59.Google Scholar
- Manguray, J., 1988. A Hands-on Approach to Clean Room Training. Proceedings of the 9th International Committee of Contamination Control Societies Conference, pp. 262–266, September 26, 1988, Los Angeles.Google Scholar
- Miller, D. P., 1988. The Architectural Ergonomics of Sandia’s RHIC-II Gowning Facility. Proceedings of the 9th International Committee of Contamination Control Societies Conference, pp. 98–103, September 26, 1988, Los Angeles.Google Scholar
- Moller, A. K., 1989. Ten Years of Training in CC-Technology in the Nordic Countries. Journal of R 3-Nordic 18(3):33–36.Google Scholar
- Phillips, Q. T., et al., 1983. Cosmetics in Clean Rooms. Journal of Environmental Sciences 26(6):21–3.Google Scholar
- Zuger, A., 1984. Education and Training for CleanRoom Personnel. Swiss Pharma 6(1la): 35–42.Google Scholar