Cleanroom Work Support Component Areas
Satisfactory cleanroom operations require adequate support components. The same care in design required for the cleanroom proper must also be used in layout of all ancillary and support areas. All items that enter or leave and activities that are carried out in the cleanroom must pass through, are stored in, or are processed in one of these auxiliary support areas. Whenever possible, the support areas are located and maintained out of the cleanroom, but some items must be within the work area. The support areas include facilities for personnel activities, for process materials, for process equipment and tool storage and maintenance, for in-process products, and for cleanroom maintenance. The support areas often contain components that can degrade cleanliness in the work area. Operation of these components must be controlled so that contamination of products within the support area is minimized and transport of contamination from these components to the cleanroom is avoided.
KeywordsSupport Area Support Component Clean Bench Reverse Osmosis Unit Tool Cleaning
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- Bourscheid, G., & Bertholdt, H., 1990. How Production Technologies Influence the Surface Quality of Ultraclean Gas-Supply Equipment: Material and Construction. Microcontamination 8(6):43–46, 103–106.Google Scholar
- Davidson, J. M., & Ruane, T. P., 1987. Gas-Handling Hardware: Considerations for Ensuring Gas Purity. Microcontamination 5(3):35–39.Google Scholar
- Henon, B. K., & Overton, J. S., 1988. Design Planning for Class I UHP Stainless-Steel Process-Gas Piping System. Microcontamination 6(2):43–47.Google Scholar
- Hirasawa, K., et al., 1984. Particle Removing Efficiency of Air Showers on Clean Room. Proceedings of the 7th International Committee of Contamination Control Societies Conference, September 1984, Paris.Google Scholar
- Jensen, D., 1987. Reducing Microcontamination Generation and Entrapment within High-Purity Gas Distribution Systems. Microcontamination 5(5):52–65.Google Scholar
- Kohler, M.S., 1988. A Temporary Partitioning System for Clean Room Rearrangements. Proceedings of the 35th Institute of Environmental Science Annual Technical Meeting, pp. 355–359, May 1988, Anaheim, CA.Google Scholar
- Michaels, L., Fickel, L. M., & Donovan, R. P., 1986. An Experimental Study of Particle Emissions from Cleanroom Papers. Journal of Environmental Science 29(6): 38–40.Google Scholar
- Schmutzler, W., 1988. Material Transport into Clean Rooms and Sterile Areas. Proceedings of the 9th International Committee of Contamination Control Societies Conference, pp. 360–364, September 26, 1988, Los Angeles.Google Scholar
- Thaman, M. G., & Greiner, M. E., 1988. Implementation of a High Throughput Facility-Wide Pure and Deionized Water System. Microelectronics Manufacturing and Testing 11(5):36–38.Google Scholar
- Workman, W. L., 1988. Contamination Control for a Submicron CMOS VLSI/ ULSI Factory. Proceedings of the 9th International Committee of Contamination Control Societies Conference, pp. 104–109, September 26, 1988, Los Angeles.Google Scholar