The basic function of the spectrometer is to provide a means of isolating a selected wavelength from the polychromatic beam of characteristic radiation excited in the sample, in order that individual intensity measurements can be made. Although this is normally achieved by making use of the specific diffracting property of large single crystals, this is not by any means the only way of selecting a specific wavelength range and other methods which have been employed include the use of diffraction gratings,1) balanced filters2–3) and energy resolution in the form of pulse height selection. The usual wavelength range of the conventional X-ray spectrometer is between 0.2 to 15 Å and over this region the single crystal is certainly the most efficient and versatile means of dispersion, particularly in combination with pulse height selection for the removal of harmonic overlap (See Chapter 4). However, the recent successful attempts to extend the operating range of the X-ray spectrometer into the soft X-ray and vacuum ultra-violet region have provided greater incentive for a more detailed study of the use of gratings in this region as well as the exclusive use of pulse height selection.
KeywordsAnalyse Crystal Lithium Fluoride Potassium Hydrogen Phthalate Ammonium Dihydrogen Phosphate Extra Reflection
Unable to display preview. Download preview PDF.
- 10.LIEBHAFSKY, PFEIFFER, WINSLOW and ZEMANY, X-Ray Absorption and Emission inAnalytical Chemistry, Wiley, New York, 1960, Ch. 4.Google Scholar
- 11.BIRKS, X-Ray Spectrochemical Analysis, Interscience, New York, 1959, Ch. 3.Google Scholar
- 12.BIRKS, Electron Probe Microanalysis, Interscience, New York, 1963, Ch. 6.Google Scholar
- 13.WYTZES, S. A., 1961, Philips Research Reports, 16, 201.Google Scholar
- 15.BUWALDA, J., 1964, Philips Serving Science and Industry, 10, 22.Google Scholar
- 16.WYTZES, S. A., Philips Technical Review, 27, 11.Google Scholar
- 19.U, W., Advances in X-Ray Analysis, Plenum, New York, 1964, 118.Google Scholar
- 22.EBERT, F. and WAGNER, A., 1957, Z. Metalk, 48, 616.Google Scholar
- 23.MACDONALD, G. L., Proceedings of 4th M.E.L. Conference on X-Ray Analysis, (Sheffield, 1964), Philips, Eindhoven, 11.Google Scholar
- 25.FISCHER, D. W. and BAUN, W. L., 1964, U.S. Technical Documentary Report, No. RTD-TDR-63–4232.Google Scholar
- 28.BAUN, W. L. and FISCHER, D. W., 1963, U.S. Technical Documentary Report, No. ASD-TDR-63–310.Google Scholar
- 29.FRANKS, Proceedings of 3rd International Symposium on X-Ray Optics and X-RayMicroanalysis, Academic Press, New York, 1963, p. 199.Google Scholar