Numerous references have established that the physical, chemical, and electrical properties of deposited dielectric films depend considerably on deposition conditions, e.g., temperature, composition of reactants, etc. Hence, it is important in specifying film property data on silicon nitride to identify the deposition process and conditions; wherever possible, this has been noted in the property data tables in this survey.


Dielectric Constant Silicon Nitride Glow Discharge Deposition Temperature Etch Rate 
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Copyright information

© IFI/Plenum Data Corporation, a Subsidiary of Plenum Publishing Corporation 1971

Authors and Affiliations

  • John T. Milek
    • 1
  1. 1.Electronic Properties Information CenterHughes Aircraft CompanyCulver CityUSA

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