Methods of Preparation

  • John T. Milek


Silicon Nitride (Si3N4) films can be prepared by several different deposition techniques:
  1. a)

    Direct nitridation

  2. b)


  3. c)

    Glow discharge (dc and rf)

  4. d)

    Sputtering (dc, rf and reactive)

  5. e)

    Pyrolytic (chemical vapor deposition or CVD)



Deposition Rate Silicon Nitride Glow Discharge Etch Rate Nitride Film 
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Methods of Preparation-References

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Copyright information

© IFI/Plenum Data Corporation, a Subsidiary of Plenum Publishing Corporation 1971

Authors and Affiliations

  • John T. Milek
    • 1
  1. 1.Electronic Properties Information CenterHughes Aircraft CompanyCulver CityUSA

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