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Methods of Preparation

  • John T. Milek

Abstract

Silicon Nitride (Si3N4) films can be prepared by several different deposition techniques:
  1. a)

    Direct nitridation

     
  2. b)

    Evaporation

     
  3. c)

    Glow discharge (dc and rf)

     
  4. d)

    Sputtering (dc, rf and reactive)

     
  5. e)

    Pyrolytic (chemical vapor deposition or CVD)

     

Keywords

Deposition Rate Silicon Nitride Glow Discharge Etch Rate Nitride Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© IFI/Plenum Data Corporation, a Subsidiary of Plenum Publishing Corporation 1971

Authors and Affiliations

  • John T. Milek
    • 1
  1. 1.Electronic Properties Information CenterHughes Aircraft CompanyCulver CityUSA

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