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High Rate Versus Low Rate Diamond CVD Methods

  • Peter K. Bachmann
  • Hans Lydtin
Part of the NATO ASI Series book series (NSSB, volume 266)

Abstract

A wide variety of methods to deposit diamond films and particles from the vapor phase emerged from different laboratories since the breakthrough publications of diamond deposition onto non-diamond substrates by B.V. Spitsyn et al [1], B.V. Derjaguin et al [2] of the USSR Academy of Science in Moscow as well as M. Kamo [3] and his colleagues at the Japanese National Institute for Research in Inorganic Materials (NIRIM). All of these methods have in common that diamond is deposited from a carbon carrier gas that is decomposed and the formation of non-diamond carbon is prevented by the presence of a selective etchant such as atomic hydrogen or oxygen.

Keywords

Diamond Film Electron Cyclotron Resonance Diamond Deposition Direct Current Plasma Microwave Torch 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1991

Authors and Affiliations

  • Peter K. Bachmann
    • 1
  • Hans Lydtin
    • 1
  1. 1.Philips Research LaboratoriesCVD-Technology GroupAachenGermany

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