Turning of Aluminum Alloy Using an Insert with a Brazed Diamond Film

  • Masao Murakawa
  • Sadao Takeuchi
Part of the NATO ASI Series book series (NSSB, volume 266)


It has been found possible to coat polycrystalline diamond1 onto different materials by use of vapor deposition methods. The coatings are expected to be put into practice in various industrial fields2,3. The technology has recently progressed to the point where diamond coated cutting inserts have begun to appear on the market4. However, since the coated diamond film inserts have relatively rough surface at the present time their performance is limited in certain cutting applications. Smooth mechanical finishing of the coating is difficult due to poor adhesion of the coating to its substrate. Because of this, the coated diamond inserts suffer not only from poor adhesion but also give a poorer surface finish of the workmaterial compared with that obtained with single crystal diamond or sintered diamond inserts. A so-called “brazed diamond film insert” has been developed5 in an effort to solve this problem of conventional coated diamond inserts; it consists of a diamond film deposited onto a silicon wafer, which has been brazed to a tungsten carbide substrate with the diamond film side facing the substrate. This manufacturing process has a disadvantage in that the silicon wafer on which diamond is deposited must be removed by a separate processing step (e.g. grinding step). Further, in the previous study5 no detailed results on the turning test of aluminum alloy containing Si have been disclosed. No detailed information, in particular, has been available comparing the performance of brazed, sintered and coated diamond inserts, which would be interesting from an industrial view point.


Tungsten Carbide Flank Wear Diamond Film Rake Face Diamond Particle 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Copyright information

© Plenum Press, New York 1991

Authors and Affiliations

  • Masao Murakawa
    • 1
  • Sadao Takeuchi
    • 1
  1. 1.Department of Mechanical EngineeringNippon Institute of TechnologySaitama-PrefectureJapan

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