Studies on the Formation of Diamond Nucleation Sites on <100> Silicon Substrates
A number of challenges present themselves in successfully growing diamond on non-diamond substrates. Among them are the formation of a high density of nucleation sites and the creation of appropriate nucleation sites for films of desired orientation and perfection. Abrasion techniques, used to increase nucleation densities, are not amenable to normal semiconductor processing sequences. The focus of this investigation is to evaluate techniques to increase the nucleation density while maintaining the perfection of diamond deposited on <100> oriented Si wafers.
KeywordsNucleation Density Diamond Coating High Microwave Power Diamond Growth Diamond Nucleation
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