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Deposition Experiments with Separated Atomic Hydrogen and CH4 Sources

  • Pierre Joeris
  • Carsten Benndorf
Part of the NATO ASI Series book series (NSSB, volume 266)

Abstract

The mechanism of low pressure diamond deposition is a matter of high interest not only for researchers but also for those who want to apply these films. Only a deep insight into the deposition process will allow the adequate design (eg. transparency, graining etc.) of diamond films for the various fields of application.

Keywords

Diamond Film Plasma Column Microwave Plasma Microwave Discharge Deposition Zone 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1991

Authors and Affiliations

  • Pierre Joeris
    • 1
  • Carsten Benndorf
    • 1
  1. 1.Institut für Physikalische ChemieUniversität HamburgHamburg 13Germany

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