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Investigations on Growth Mechanisms of Diamond Thin Films by Hot Filament Assisted CVD

  • J. Mercier
  • A. M. Bonnot
  • E. Caignol
  • E. Gheeraert
Part of the NATO ASI Series book series (NSSB, volume 266)

Abstract

Since the pioneering work of Derjaguin1, the development of various processes of diamond thin film deposition under subatmospheric pressure and relatively low temperature has been impressive. The state of the art has been reviewed 2, 3, 4. Our experience is in the process of hot filament assisted CVD5. Here are discussed some kinetic aspects of the results of a parametric study carried out by our group6, 7.

Keywords

Mutual Diffusion Coefficient Subatmospheric Pressure Film Coverage Surface Reaction Rate Diamond Thin Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1991

Authors and Affiliations

  • J. Mercier
    • 1
  • A. M. Bonnot
    • 1
  • E. Caignol
    • 1
  • E. Gheeraert
    • 1
  1. 1.LEPES — CNRS associated with University J. FourierGrenoble CedexFrance

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