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Electron Spectroscopy on Carbon Based Films: Bulk and Interface Properties

  • Peter Oelhafen
  • Dario Ugolini
  • Sabine Schelz
  • Jürgen Eitle
Part of the NATO ASI Series book series (NSSB, volume 266)

Abstract

Photoelectron spectroscopy is one of the most powerful tools in order to analyse the electronic structure of matter. It has been extensively applied to the gas, liquid and solid state phases [1, 2, 3, 4]. Depending on the energy of the incoming photons and the detection mode of the emitted photoelectrons detailed information on the core electrons, dispersion relation E(k) of valence electrons, spin polarisation, local (site decomposed) and partial (angular momentum decomposed) density of electronic states (DOS) can be obtained. From these data many other properties can be determined: elemental composition, chemical state, depth and laterally resolved composition, structural information, Fermi level position, workfunction, magnetic moment and state density of the Fermi energy (E F). The latest developments include the observation of the energy gap in high Tc superconductors [5] and the application of photoelectron diffraction [6].

Keywords

Deposition Time Interface Phase Interface Roughness Core Line Valence Band Spectrum 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. [1]
    In M. Cardona and L. Ley, editors, Photoemission in Solids I and II,Springer, (1985).Google Scholar
  2. [2]
    In D. Briggs and M. P. Seah, editors, Practical Surface Analysis,Wiley and Sons, (1983).Google Scholar
  3. [3]
    P. Oelhafen. In E. Löscher, G. Fritsch, and G. Jacucci, editors, Amorphous and Liquid Materials, page 333, Martinus Nijhoff Publishers, Dordrecht, Boston, Lancaster, (1987).Google Scholar
  4. [4]
    G. Indlekofer and P. Oelhafen. In M. Borrisov, N. Kirov, and A. Vavrek, editors, Disordered Systems and New Materials, page 707, World Scientific Publishing Co., Singapore, (1989).Google Scholar
  5. [5]
    J. M. Imer, F. Patthey, B. Dardel, W. D. Schneider, Y. Baer, Y. Petroff, and A. Zettl. Phys. Rev. Letters 62, 336 (1989).ADSCrossRefGoogle Scholar
  6. [6]
    J. Osterwalder, T. Greber, S. Hüfner, and L. Schlapbach. Phys. Rev. Letters 64, 2683 (1990).ADSCrossRefGoogle Scholar
  7. [7]
    M. P. Seah and W. A. Dench. Surface and Interface Analysis 1, 2 (1979).CrossRefGoogle Scholar
  8. [8]
    P. Oelhafen and D. Ugolini. In P. Koidl and P. Oelhafen, editors, Amorphous Hydrogenated Carbon Films, page 267, Les Editions de Physique, Les Ulis (France), (1987).Google Scholar
  9. [9]
    H. R. Kaufman. J. Vac. Sci. and Technol. 15, 272 (1978).MathSciNetGoogle Scholar
  10. [10]
    S. Schelz, J. Eitle, R. Steiner, and P. Oelhafen. (1990). Contribution to ICSFS-5 conference.Google Scholar
  11. [11]
    R. Zehringer, H. Künzli, P. Oelhafen, and C. Hollenstein. J. Nucl. Mat. (1990). in press.Google Scholar
  12. [12]
    A. Bianconi, S. B. M. Hagström, and Bachrach R. Z. Phys. Rev. B 16, 5543 (1977).CrossRefGoogle Scholar
  13. [13]
    F. R. McFeely, S. P. Kowlczyk, L. Ley, R. G. Cavall, R. A. Pollak, and D. A. Shirley. Phys. Rev. 13 9, 5268 (1974).Google Scholar
  14. [14]
    F. J. Ilimpsel, J. F. van der Veen, and 1). E. Eastman. Phys. Rev. B 22, 1967 (1980).MathSciNetCrossRefGoogle Scholar
  15. [15]
    F. C. Chalkin. Proc. Royal Soc. A 194, 42 (1948).ADSCrossRefGoogle Scholar
  16. [16]
    Chr. Beyreuther, R. Hierl, and G. Wiech. Ber. Bunsen ges. Phys. Chem. 79, 1081 (1977).Google Scholar
  17. [17]
    G. Wiech and E. Zöpf. Electronic Density of States, chapter, page 335. Natl. Bur. Stand. Publ. 323, US GPO, Washington D. C., (1969).Google Scholar
  18. [18]
    J. Fink, T. Müller-Heinzerling, J. Pfluger, A. Bubenzer, P. Koidl, and G. Greceling. Solid State Commun. 47, 887 (1983).CrossRefGoogle Scholar
  19. [19]
    P. Oelhafen, J.L. Freeouf, J.M.E. Harper, and J.J. Cuomo. Thin Solid Films 120, 231 (1984).ADSCrossRefGoogle Scholar
  20. [20]
    C. Weissmantel, K. Bewilogua, D. Dietrich, H. J. Erler, H. J. Hinneberg, S. Klose, W. Nowick, and G. Reisse. Thin Solid Films 72, 19 (1980).ADSCrossRefGoogle Scholar
  21. [21]
    D. Ugolini, M. H. Tuilier, J. Eitle, J.Q. Wang, and P. Oelhafen. Appl. Phys. A (1990). in press.Google Scholar
  22. [22]
    P. Oelhafen and D. Ugolini. In P. Koidl and P. Oelhafen, editors, Amorphous Hydrogenated Carbon Films, page 137, Les Editions de Physique, Les Ulis (France), (1987).Google Scholar
  23. [23]
    D. Ugolini, P. Oelhafen, and M. Wittmer. In P. Koidl and P. Oelhafen, editors, Amorphous Hydrogenated Carbon Films, page 287, Les Editions de Physique, Les Ulis (France), (1987).Google Scholar
  24. [24]
    D. Ugolini, P. Oelhafen, and M. Wittmer. In P. Koidl and P. Oelhafen, editors, Amorphous Hydrogenated Carbon Films, page 297, Les Editions de Physique, Les Ulis (France), (1987).Google Scholar
  25. [25]
    D. Ugolini, J. Eitle, P. Oelhafen, and M. Wittmer. Appl. Phys. A 48, 549 (1989).ADSCrossRefGoogle Scholar
  26. [26]
    M. Wittmer, D. Ugolini, J. Eitle, and P. Oelhafen. Appl. Phys. A. 48, 559 (1989).ADSCrossRefGoogle Scholar
  27. [27]
    M. Wittmer, D. Ugolini, and P. Oelhafen. J. Electrochem. Soc. (1989). accepted for publication.Google Scholar
  28. [28]
    C. D. Wagner, W. M. Riggs, L. E. Davis, J. F. Moulder, and G. E. Mullenberg. Eden Prairie, Perkin Elmer Corporation, (1979).Google Scholar
  29. [29]
    L. Ley, R. A. Pollak, F. R. McFeely, S. D. Kowalczyk, and D. A. Shirley. Phys. Rev. B 9, 600 (1974).ADSCrossRefGoogle Scholar
  30. [30]
    W. Ranke and K. Jacobi. Nog. Surf. Sei. 10, 1 (1981). and references therein.Google Scholar
  31. [31]
    F. A. Shunk. Constitution. of Binary Alloys. Mc Graw-Hill, New York, (1985).Google Scholar
  32. [32]
    M. G. Crescenzi, P. Picozzi, S. Santucci, C. Battistoni, and G. Mattogo. Solid State Commun. 51, 811 (1983).CrossRefGoogle Scholar
  33. [33]
    M. G. Mason. Phys. Rev. B 27, 748 (1983).ADSCrossRefGoogle Scholar
  34. [34]
    I). Ugolini, J. Eitle, and P. Oelhafen. Vacumn (1990). in press.Google Scholar

Copyright information

© Plenum Press, New York 1991

Authors and Affiliations

  • Peter Oelhafen
    • 1
  • Dario Ugolini
    • 1
  • Sabine Schelz
    • 1
  • Jürgen Eitle
    • 1
  1. 1.Institut für PhysikUniversität BaselBaselSwitzerland

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