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Depth Profiling of Rh/CeO2 Catalysts: An Alternative Method for Dispersion Analysis

  • A. R. González-Elipe
  • J. P. Holgado
  • R. Alvarez
  • J. P. Espinós
  • A. Fernández
  • G. Munuera
Part of the NATO ASI Series book series (NSSB, volume 265)

Abstract

Depth profiles of Rh in two Rh/CeO2 catalysts prepared from RhCl3 and Rh(NO3)3 have been obtained by means of Ar sputtering and XPS analysis. A mathematical model describing the sputtering behaviour of powder materials has been used to simulate the depth profiles of the samples. In this way, semiquantitative information about the dispersion of the rhodium has been obtained for the precursor, the calcined and reduced states of the two samples, showing that a progressive agglomeration of the rhodium occurs during the calcining and reducing treatments. The results show that this agglomeration depends on the presence of chlorine in the precursor.

Keywords

Depth Profile Catalyst Sample Steady State Intensity Dispersion Degree Nitrate Salt 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1991

Authors and Affiliations

  • A. R. González-Elipe
    • 1
  • J. P. Holgado
    • 1
  • R. Alvarez
    • 1
  • J. P. Espinós
    • 1
  • A. Fernández
    • 1
  • G. Munuera
    • 1
  1. 1.Dpto de Química InorgánicaInstituto de Ciencias de Materiales de Sevilla (CSIC-Univ. de Sevilla)SevillaSpain

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