A Model for Characterising the Growth of Ruthenium on Amorphous Alumina by the use of the Auger Parameter
With XPS enjoying a high popularity in surface science, mainly due to the ease with which quantitative information is obtained, recent developments of the technique have centred around gaining a better understanding of the inherent characteristics of the photoemission process. In its application to catalyst characterisation this has fuelled a discussion on the influence of particle size on binding energy shifts1–3. In this context, it has been realised that the X-ray induced Auger peaks in an XPS spectrum in the form of the Auger parameter can be used for a more detailed analysis. The Auger parameter α’ for any element is the relative difference between the binding energy of a photoelectron line E(PE)be and kinetic energy of a related Auger electron emission E(XAES)ke from same element on the same energy scale.
KeywordsAlumina Substrate Alumina Film Amorphous Alumina Ruthenium Atom Auger Parameter
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