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Process Control in IC Manufacturing with Thermal Waves

  • Allan Rosencwaig
Chapter
Part of the Review of Progress in Quantitative Nondestructive Evaluation book series

Abstract

In today’s semiconductor market, manufacturers face a daunting challenge. Product concepts evolve rapidly in response to rapidly changing markets while design rules, i.e., device geometries, become increasingly smaller and wafers become larger. Devices must run faster, reliability must improve and the resultant increasing complexity in IC design and fabrication technology intensifies the need for tighter controls of process variables. To compete effectively in this market, manufacturers must improve both product development and product manufacturing processes.

Keywords

Thermal Wave Statistical Process Control Thin Titanium Film Tungsten Silicide Transistor Threshold Voltage 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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Copyright information

© Springer Science+Business Media New York 1990

Authors and Affiliations

  • Allan Rosencwaig
    • 1
  1. 1.Therma-Wave, Inc.FremontUSA

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