Structural and Chemical Characterization of Semiconductor Interfaces by High Resolution Transmission Electron Microscopy
Modern growth techniques allow the fabrication of multi-layered systems, with electronic properties that can be turned to the particular application in mind. These systems necessarily contain many interfaces, whose structure can profoundly influence their electronic characteristics. Since the individual layers are sometimes only a few lattice parameters thick, a full characterization of these interfaces requires atomic resolution both spatially and chemically.
KeywordsHigh Resolution Transmission Electron Microscopy High Resolution Transmission Electron Microscopy Interfacial Roughness Interfacial Oxide Atomic Column
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