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Self-Diffusion and Impurity Diffusion of FCC Metals Using the Embedded Atom Method

  • J. B. Adams
  • S. M. Foiles
  • W. G. Wolfer

Abstract

Diffusion in FCC metals at medium and high temperatures occurs primarily by a vacancy mechanism. Diffusion is dominated by the contribution of mono-vacancies, but the contribution of di-vacancies is significant at high temperatures.

Keywords

Activation Energy Noble Metal Impurity Atom Migration Energy Impurity Diffusion 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • J. B. Adams
    • 1
  • S. M. Foiles
    • 1
  • W. G. Wolfer
    • 1
  1. 1.Theoretical DivisionSandia National LaboratoriesLivermoreUSA

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