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Growth of High-Temperature Superconductor Thin Films on Lanthanum Aluminate Substrates

  • R. W. Simon
  • A. E. Lee
  • C. E. Platt
  • K. P. Daly
  • J. A. Luine
  • C. B. Eom
  • P. A. Rosenthal
  • X. D. Wu
  • T. Venkatesan

Abstract

We report on the use of the pseudo-perovskite crystalline compound LaA1O3 as a substrate for thin-film growth of high-temperature superconductors. Lanthanum aluminate provides a good lattice match to the basal plane of the superconducting cuprates with its lattice constant of 3.792Å. In contrast with strontium titanate, LaA1O3 also serves as a useful substrate for high-frequency applications with its low dielectric constant (~16) and low microwave losses (5 × 10-6 loss tangent at 4.2 K). In this paper we compare the properties of a number of crystalline substrates for use with high-temperature superconducting films.

We have tested the use of LaAlO3 with thin films of erbium-barium-copper-oxide and yttrium-barium-copper-oxide made by a variety of techniques including multisource sputtering, single-target sputtering, electron-beam evaporation, and pulsed laser deposition. High-quality epitaxial films have been produced using both single-step (in situ) and multi-step (post-anneal) processing. Films on LaAlO3 exhibit sharp resistive transitions, high current density, strong c-axis orientation, and bulk superconducting properties as evidenced by magnetic susceptibility measurements. Substrate-film interaction effects appear to be minimal for the LaAlO3/1-2-3 system and the thermal expansion properties of LaAlO3 substrates are very compatible with 1-2-3 films.

Keywords

Pulse Laser Deposition Loss Tangent Critical Current Density Strontium Titanate Cuprate Superconductor 
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Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • R. W. Simon
    • 1
  • A. E. Lee
    • 1
  • C. E. Platt
    • 1
  • K. P. Daly
    • 1
  • J. A. Luine
    • 1
  • C. B. Eom
    • 2
  • P. A. Rosenthal
    • 2
  • X. D. Wu
    • 3
  • T. Venkatesan
    • 3
  1. 1.TRW Space and Technology GroupRedondo BeachUSA
  2. 2.Applied Physics DepartmentStanford UniversityStanfordUSA
  3. 3.Physics DepartmentRutgers UniversityPiscatawayUSA

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