Magnetron Sputtering of Thin Films of Tl-Ca-Ba-Cu-O
Superconducting thin films of the Tl-Ca-Ba-Cu-O system have been prepared by magnetron sputtering from a single compound target and post deposition annealing in an overpressure of Tl. The films are deposited on <100> MgO and <100> yttria stabilized zirconia (YSZ). The anneals were done at atmospheric pressure and the anneal protocols used result in both the 2122 and 2223 phases. The best films are grown on the YSZ substrates and have zero resistance at 107°K. RF surface resistance was measured as a function of the oxygen partial pressure during the post deposition anneals. The lowest surface resistance measurements were obtained for the 100% oxygen partial pressure anneals.
KeywordsOxygen Partial Pressure Yttria Stabilize Zirconia Surface Resistance Yttrium Iron Garnet Post Deposition Anneal
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