Advertisement

As-Deposited Superconducting Y-Ba-Cu-O Thin Films on Si, SiO2, GaAs and Ni/Cu Substrates by High Pressure DC Sputtering Process

  • R. J. Lin
  • P. T. Wu

Abstract

The superconducting Y-Ba-Cu-O thin films on Si, SiO 2 , GaAs and Ni/Cu substrates have been reproducibly prepared by high pressure DC sputtering process without further annealing treatment. The superconductivity of the films is Tc(onset)=95K and Tc(zero)=70K. The targets were Y-Ba-Cu-O compounds made by solid state reaction. The substrate temperature is lower than 450°C. X-ray analysis indicates that the 0.6~2μm films consist of predomintly the orthorhombic superconducting phase of YBa 2 Cu 3 Ox with traces of CuO. The effect of processing parameters on the superconductivity of the films will be discussed.

Keywords

GaAs Substrate Film Composition Zero Field Cool Target Composition Industrial Technology Research Institute 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    A. Mogro-campero and L.G. Turner, Appl. Phys. Lett. 52: 1185 (1988).ADSCrossRefGoogle Scholar
  2. 2.
    V. Valvoda et al., Thin Solid Films 156: 53 (1984).Google Scholar
  3. 3.
    Brian Chapman, “Glow Discharge Processes”, John Wiley & Sons, p./8 (1980).Google Scholar
  4. 4.
    M. Hecq, et al., Thin Solid Films 115: L45 (1984).ADSCrossRefGoogle Scholar
  5. 5.
    R.J. Lin, Y.C. Chen, J.H. Kung and P.T. Wu, Mat. Res. Soc. Symp. Proc. 99: 319 (1987).CrossRefGoogle Scholar
  6. 6.
    R.J. Lin, J.H. Kung and P.T. Wu, Physica C 153–155: 796 (1988).Google Scholar
  7. 7.
    R.J. Lin, J.H. Kung and P.T. Wu, Proc. MRS Int. Meet. on Advanced Materials, Tokyo, MRS (1988).Google Scholar
  8. 8.
    R.J. Lin and John Lin, Proc. MRS Int. Meet. On Advanced Materials, Tokyo, MRS (1988).Google Scholar
  9. 9.
    CRC Handbook of Chemistry and Physics, edited by R.C. Weast, 58th edition (1978).Google Scholar
  10. 10.
    John A. Thornton, in Deposition Technologies for Films and Coating, edited by R.F. Bunshah, Noyk, Park Ridge (1982).Google Scholar
  11. 11.
    W.D. Kingery, et al., in “Introduction to Ceramics”, John Wiley and Sons (1976).Google Scholar
  12. 12.
    Norio Terada, et al., Jpn. J. Appl. Phys., 27: L639 (1988).ADSCrossRefGoogle Scholar

Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • R. J. Lin
    • 1
  • P. T. Wu
    • 1
  1. 1.Materials Research LaboratoriesIndustrial Technology Research InstituteChutung, HsinchuTaiwan, R.O.C.

Personalised recommendations