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YBa2Cu3O7 Thin Films Prepared by Evaporation from Yttrium, Copper and BaF2

  • I. D. Raistrick
  • F. H. Garzon
  • J. G. Beery
  • D. K. Wilde
  • K. N. Springer
  • R. J. Sherman
  • R. A. Lemons
  • A. D. Rollett

Abstract

The recent discovery of high-temperature superconductivity in mixed-valence copper oxides has stimulated great interest in the development of thin films suitable for a variety of electronic applications. These applications range from simple electronic interconnects and transmission lines, through junction devices, such as IR detectors and SQUIDS, to complex Josephson structures for memory and logic applications. Although each application imposes different materials constraints, most have a number of requirements in common. Foremost among these is the ability to make thin, superconducting films with highly controlled properties. Although the relationships between, for example, microstructure and electronic properties are not well understood at present, it is clear that fabrication and processing variables must be specially optimized for this new class of materials.

Keywords

Critical Current Density Strontium Titanate Barium Fluoride High Quality Film Thin Film Prepare 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. [1].
    P.M. Mankiewich, J. H. Scofield, W. J. Skocpol, R. E. Howard, A. H. Dayem and E. Good, Appl. Phys. Lett. 51, 1753 (1987).ADSCrossRefGoogle Scholar
  2. [2]
    J. A. Martin, M. Nastasi, J. R. Tesmer and C. J. Maggiore App. Phys. Lett. 52 2177 (1988).Google Scholar
  3. [3]
    C. B. Mombouquette, J. G. Beery, D. R. Brown, R. A. Lemons and I. D. Raistrick. These proceedings.Google Scholar
  4. [4]
    R. S. Roth, J. R. Dennis and K. L. Davis, Phase Diagrams for Ceramists, American Ceramic Society, Columbus, Ohio (1987).Google Scholar
  5. [5]
    A. F. Marshall, R. W. Barton, K. Char, A. Kapitulnik, B. Oh, R. H. Hammond, and S. S. Laderman, Phys.Rev. B 37, 9353 (1988).ADSCrossRefGoogle Scholar
  6. [6]
    F. H. Garzon, J. G. Beery, D. M. Brown, R. J. Sherman and I. D. Raistrick, submitted to Appl. Phys. Lett.Google Scholar
  7. [7]
    J. A. Basmajian and R. C. DeVries, J. Am. Cer. Soc., 40, 374 (1957).CrossRefGoogle Scholar
  8. [8]
    J. M. Tarascon, L. H. Greene, B. G. Bagley, W. R. McKinnon P. Barboux and G. W. Hull in Novel Superconductivity eds. S. A. Wolf and V. Z. Kresin. Plenum, New York (1987).Google Scholar
  9. [9]
    K. Wasa, M. Kitabatake, H. Adachi, K. Setsune and K. Hirochi in Thin Film Processing and Characterization of High Temperature Superconductors eds. J. M. E. Harper, R. J. Colton and L. C. Feldman, American Inst. Pysics, NY 1988.Google Scholar
  10. [10]
    P.K. Gallagher, H. M. O’Bryan, S. A. Sunshine and D. W. Murphy, Mat. Res. Bull. 22, 995 (1987).CrossRefGoogle Scholar
  11. [11]
    J. D. Jorgensen, M. A. Beno, D. G. Hinks, L. Soderholm, K. J. Volin, R. L. Hitterman, J. D. Grace, I. K. Schuller, C. U. Serge, K. Zhang and M. S. Kleefisch, Phys. Rev. B 36, 3608 (1987).ADSCrossRefGoogle Scholar
  12. [12]
    L H. Allen, P. R. Broussard, J. H. Claassen and S. A. Wolf Appl. Phys. Lett. 53 1338 (1988).Google Scholar
  13. [13]
    G. Deutscher and K. A. Müller, Phys. Rev. Lett. 59 1745 (1987).ADSCrossRefGoogle Scholar
  14. [14]
    P. G. de Gennes, Rev. Mod. Phys. 36 225 (1964).ADSCrossRefGoogle Scholar
  15. [15]
    C. M. Falco, W. H. Parker, S. E. Trullinger and P. K. Hansma, Phys. Rev. B 10 1867 (1974).ADSCrossRefGoogle Scholar
  16. [16]
    M. Leung, U. Strom, J. C. Culbertson, J. H. Claassen, S. A. Wolf and R. W. Simon, Appl. Phys. Lett. 50 1691 (1987).ADSCrossRefGoogle Scholar
  17. [17]
    Y. Enomoto and T. Murakami, J. Appl. Phys. 59 3807 (1986).ADSCrossRefGoogle Scholar
  18. [18]
    M. G. Forester, M. Gottlieb, J. R. Gavaler and A. I. Braginski Appl. Phys. Lett. 53 1332 (1988).Google Scholar
  19. [19]
    M. Leung, P. R. Broussard, J. H. Claassen, M. Osofsky, S. A. Wolf and U. Strom, Appl. Phys. Lett. 51 2046 (1987).ADSCrossRefGoogle Scholar
  20. [20]
    D. P. Osterman, R. Drake, R. Pratt, E. K. Track, M. Radparvar and S. M. Faris, To be published.Google Scholar

Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • I. D. Raistrick
    • 1
  • F. H. Garzon
    • 1
  • J. G. Beery
    • 1
  • D. K. Wilde
    • 1
  • K. N. Springer
    • 1
  • R. J. Sherman
    • 1
  • R. A. Lemons
    • 1
  • A. D. Rollett
    • 1
  1. 1.Los Alamos National LaboratoryLos AlamosUSA

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