Scanning RHEED Studies of Silicide Formation in a UHV-SEM
A variety of techniques for studying surfaces have been developed or adapted to UHV recently, including TEM, REM, SEM and STM. The scanning or probe forming techniques offer a great advantage in flexibility over parallel imaging techniques since many different signals may be used to form the image. A familiar example is Auger electron yield, used in scanning Auger microprobe instruments. RHEED provides a particularly strong and surface sensitive signal, yet it is seldom used or exploited in UHV microprobe instruments, primarily due to the conflicting requirements of a well colli-mated beam and a small spot size. Use of a field emission gun (FEG) with its superior brightness makes possible a combined scanning diffraction and microanalysis instrument. We describe here such a custom built UHV-SEM-FEG+diffraction instrument and discuss is application to a study of epitaxial growth of nickel overlayers on silicon.
KeywordsDark Field Image Spot Intensity Coverage Dependence RHEED Pattern Small Spot Size
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- 3.J. Orloff, Scanning Electron Microscopy-I, 39 (1979).Google Scholar
- 14.B. N. Halawith, Master’s Thesis, Arizona State University, unpublished (1986).Google Scholar
- 16.Structure Reports (compound, vol., page) = Ni3Si(15, 108), Ni2Si-theta (16, 123), Ni2Si-delta(16, 123), NiSi(35a, 86), NiSi2(13, 90).Google Scholar