Radical-Induced Degradation of Organic Halogen and Sulfur Compounds in Oxygenated Aqueous Solutions
Halogenated and sulfur-containing organic compounds are two groups of chemicals that have long attracted the attention of scientists interested in free radicals. Numerous studies on aliphatic halogen substrates, for example, CCl4 or halothane (CF3CHClBr), have revealed a striking similarity between the product patterns obtained from metabolism and from free radical-induced degradation in vitro.1 This finding renders free radical studies potentially useful tools for understanding the chemistry of metabolic pathways.
KeywordsPeroxyl Radical Propyl Gallate Oxygen Addition Thiyl Radical Pulse Radiolysis Study
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