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The Characterization of Depth Profiles of Thin Films and Interfaces by Nuclear Scattering Techniques

  • C. Chauvin
  • J. F. Currie
  • S. Poulin-Dandurand
  • E. Sacher
  • A. Yelon
  • P. Aubry
  • L. Lemay
  • S. Gujrathi
  • J.-P. Martin

Abstract

In an effort to reduce both space and cost, modern packaging technology has turned to miniaturization. This necessitates the development and use of techniques capable of measurements on both thin films and their interfaces. This is important for spun-on films such as polyamic acids, where surface tension effects during cure [1,2] lead to changes in both physical and chemical properties [1,3]. It is important, as well, for plasma-deposited films such as hydrogenated amorphous silicon (a-Si:H), where both physical and chemical properties of deposited films depend on the deposition parameters [4–6].

Keywords

Target Atom Surface Tension Effect Adhesion Promotor Nuclear Scattering Polyamic Acid 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1987

Authors and Affiliations

  • C. Chauvin
    • 1
  • J. F. Currie
    • 1
  • S. Poulin-Dandurand
    • 1
  • E. Sacher
    • 1
  • A. Yelon
    • 1
  • P. Aubry
    • 2
  • L. Lemay
    • 2
  • S. Gujrathi
    • 2
  • J.-P. Martin
    • 2
  1. 1.Groupe des Couches Minces and Département de Génie PhysiqueEcole Polytechnique de MontréalQuébecCanada
  2. 2.Groupe des Couches Minces and Laboratoire de Physique NucléaireUniversité de MontréalQuébecCanada

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