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Laser (and Other) Diagnostics of RF Discharges

  • Carl E. Gaebe
  • Richard A. Gottscho
Part of the NATO ASI Series book series (ASIB, volume 149)

Abstract

Interest in radio frequency glow discharges has burgeoned in recent years because of the wide-spread use of plasmas in the electronics and photonics industries for fabrication of microscopic circuit components. Plasmas are used because: (1) they provide a means for achieving directional surface chemistry, through the directional transport of ions and electrons across the sheaths to device surfaces; and, (2) because they provide a means for achieving high temperature chemistry without the use of high temperatures (Tang and Hess, 1984), through the formation of radicals by electron impact dissociation. RF plasmas are used primarily to avoid surface charging when etching or depositing insulating thin films. Despite the complexity of plasma reactions and past emphasis on understanding dc glow discharges, radio frequency plasmas have been used successfully in producing desired device structures. However, it is probably an understatement to say that few processes have been optimized for the range of desired results, for this can only be realized by accident or extensive empirical investigation of a multi-dimensional, non-linear parameter space.

Keywords

Sheath Region Cathode Sheath Ground State Density Radio Frequency Glow Discharge Optogalvanic Spectroscopy 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1986

Authors and Affiliations

  • Carl E. Gaebe
    • 1
  • Richard A. Gottscho
    • 1
  1. 1.AT&T Bell LaboratoriesMurray HillUSA

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