Advertisement

Electron Beam Lithography

  • W. Kulcke
Part of the The IBM Research Symposia Series book series (IRSS)

Abstract

Over the past decade, the trend in integrated circuits for computers always has been a doubling of the circuit density every year. To-day’s products have 64.000 memory cells or 700 logic circuits on a 5 × 5 mm2 sized chip. For to-morrow, we can expect 288.000 and 516.000 memory cells or 5000 logic circuits on a chip.

Keywords

Electron Beam Electron Beam Lithography Laser Interferometer Mask Pattern Shadow Image 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    D. R. Herriott, R. L. Collier, D. S. Alles, J. W. Stafford: IEEE Trans. Electron Devices, Vol. ED-22, No. 7, p. 385, July 1975.CrossRefGoogle Scholar
  2. 2.
    H. C. Pfeiffer, 14th EIP Beam Symp., Palo Alto, Calif., May 1977. E. Goto, T. Soma, M. Idesawa, ibid. M. G. R. Thomson, R. J. Collier, D. R. Herriott, ibid. J. Trotel, ibid.Google Scholar
  3. 3.
    R. Ward, A. R. Franklin, P. Gould, M. J. Plummer: J.Vac.Sci.Technol., 19 (4), Nov/Dec 1982Google Scholar
  4. 4.
    H. Bohlen, J. Greschner, J. Keyser, W. Kulcke, P. Nehmiz, IBM J.Res. & Dev., Sept. 1982Google Scholar
  5. 5.
    J. Greschner, H. Bohlen, H. Engelke, P. Nehmiz: Proc. 9th Intern. Conf. on EI Beam Science and Techn. p. 152–160, 1980.Google Scholar

Copyright information

© Plenum Press, New York 1984

Authors and Affiliations

  • W. Kulcke
    • 1
  1. 1.German Manufacturing Technology CenterIBM Deutschland GmbHSindelfingenGermany

Personalised recommendations