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Physico-Chemical Basis of Laser Lithography

  • S. M. Metev
Part of the NATO Advanced Study Institutes Series book series (NSSB, volume 84)

Abstract

The modern microelectronics needs new methods for pattern generation, which may ensure higher quality and resolution than the photolithographic method. At the present the X-ray and the electron beam lithography methods are under fast development. The specific properties of the laser radiation make it very effective for pattern generation and the results obtained are comparable with these of the X-ray and the electron beam lithographies.

Keywords

Laser Radiation Image Recording Electron Beam Lithography Projection Scheme Thin Metal Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1983

Authors and Affiliations

  • S. M. Metev
    • 1
  1. 1.Faculty of PhysicsSofia UniversitySofiaBulgaria

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