Thin Film Reaction Induced by CW Scanned Laser and E-Beam

  • J. L. Regolini
  • T. Shibata
  • T. W. Sigmon
  • J. F. Gibbons
Part of the NATO Advanced Study Institutes Series book series (NSSB, volume 84)


The reaction of thin metal films with both single and polysilicon to form silicide compounds has received wide attention in the past few-years. The properties of thin-film metal suicides formed at temperatures below the melting points of the components is of interest from both technological and fundamental aspects.


Silicide Film Laser Power Level Energetic Beam Surface Color Change Read Camera 
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Copyright information

© Plenum Press, New York 1983

Authors and Affiliations

  • J. L. Regolini
    • 1
  • T. Shibata
    • 2
  • T. W. Sigmon
    • 2
  • J. F. Gibbons
    • 2
  1. 1.Centro Atomico BarilocheArgentina
  2. 2.Stanford Elec. Labs.USA

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