TEM Study of Microstructure and Crystallography at the TiC/Cemented Carbide Interface

  • S. Vuorinen
  • A. Horsewell


Titanium carbide coating layers on cemented carbide substrates have been investigated by transmission electron microscopy. Microstructural variations within the typically 5 μm thick chemical vapour deposited (CVD) Tic coating were found to vary with deposit thickness such that a layer structure could be delineated. Close to the interface further microstructural inhomogeneities were observed, there being a clear dependence of TiC deposition mechanism on the chemical and crystallographic nature of the upper layers of the multiphase substrate.

Coherent layers of TiC grains are found on the dominant \( \left\{ {10\bar 10} \right\} \) and {0001} surfaces of WC grains. Three different orientation relationships are found on \( \left\{ {10\bar 10} \right\} \) and one on {0001}. Misfit accommodation is discussed.


Chemical Vapour Depo Orientation Relationship Tungsten Carbide Titanium Carbide Dark Field Micrographs 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    H. E. Hinterman, H. Gass, and J. N. Lindstrom, in: “Proceeding of the 3rd International Conference on Chemical Vapor Deposition,” F. A. Glaski, ed., American Nuclear Soc., Hinsdale, Illinois, 352 (1972).Google Scholar
  2. 2.
    W. Rupert, ibid, 340.Google Scholar
  3. 3.
    N. K. Sharma, W. S. Williams, and R. Gottshall, Thin Solid Films 45:265 (1977).CrossRefGoogle Scholar
  4. 4.
    E. Breval and S. Vuorinen, Mat. Sci. and Eng. 42:361 (1980).CrossRefGoogle Scholar
  5. 5.
    V. K. Sarin, in: “Proceedings of the 7th International Conference on Chemical Vapor Deposition,” The Electrochemical Soc., Princeton, NJ (1979).Google Scholar
  6. 6.
    V. K. Sarin and J. N. Lindstrom, J. Electrochem. Sci. 126:1281 (1979).CrossRefGoogle Scholar
  7. 7.
    K. G. Stjernberg, H. Gass, and H. E. Hintermann. Thin Solid Films, 40:81 (1977).CrossRefGoogle Scholar
  8. 8.
    E. K. Storms, “The Refractory Carbides,” Academic Press, New York (1967).Google Scholar
  9. 9.
    F. C. Frank and J. H. van der Merwe, Proc. Roy. Soc., A198: 205Google Scholar
  10. 10.
    J. W. Matthews, IBM Res. Rep. RC 4266 (no. 19084) (1973).Google Scholar

Copyright information

© Plenum Press, New York 1983

Authors and Affiliations

  • S. Vuorinen
    • 2
  • A. Horsewell
    • 2
    • 1
  1. 1.Metallurgy DepartmentRisø National LaboratoryRoskildeDenmark
  2. 2.Laboratory of Applied Physics ITechnical University of DenmarkLyngbyDenmark

Personalised recommendations