Mutation Induction in a Radiation-Sensitive Variant of Mammalian Cells
Ultraviolet light (UV)-induced mutations were compared between a UV-sensitive variant and its parental mouse lymphoma cell line. The variant was originally isolated for its sensitivity to 4-nitroquinoline-1-oxide by employing a replica plating method and proved to be sensitive to the killing by UV as well. Caffeine potentiation of UV killing was observed to a similar extent in the variant and the parental cells, indicating that the caffeine-insensitive process is responsible for UV sensitivity in the variant. The induced mutation frequency as determined by resistance to 6-thioguanine was higher in the variant than in the parental cells per unit dose of UV as well as at the comparable survival level.
KeywordsParental Cell Xeroderma Pigmentosum Ataxia Telangiectasia Replica Plating Postreplication Repair
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- 11.Trosko, J. E., R. S. Schultz, C. C. Chang, and T. Glover, Ultraviolet light induction of diphtheria-toxin resistant mutations in normal and DNA repair-deficient human and Chinese hamster fibroblasts, This volume.Google Scholar