The Preparation and Photooxidative Degradation of Polyesterurethanepoly(Methyl Methacrylate) Triblock Copolymers
Block copolymers of the ABA type made from hydrocarbon monomers by anionic polymerization have been extensively investigated (1, 2). Much less has been done with nonhydrocarbon block polymers. Such systems as have been repotted show even broader temperature ranges of technical utility than the more familiar styrene/diene/styrene systems (3, 4, 5). It is the purpose of this paper to describe a process for preparing polymethyl methacrylate containing triblock copolymers. The physical property balances that can be gotten and the photooxidative degradation processes that occur will also be covered.
KeywordsBlock Copolymer Methyl Methacrylate TRIBLOCK Copolymer Soft Segment Tensile Elongation
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