Charge Neutralization of Medium Energy H and 4He Ions Backscattered from Solid Surfaces, Effects of Surface Cleaning

  • T. M. Buck
  • L. C. Feldman
  • G. H. Wheatley


Experiments on charge states of H and 4He backscattered from silicon and gold surfaces in the energy range 25–190 keV have been extended to investigate surface impurity and surface cleaning effects. The average charge state of 4He scattered from iodine or gold impurities on silicon surfaces was close to that of 4He scattered from silicon at the same energy. Argon bombardment cleaning of a gold surface caused substantial changes in neutralization for both 4He and H, similar to results of Phillips in the case of hydrogen, and suggestive of more than one neutralization mechanism. The results are consistent with a neutralization step occurring outside the surface as the particle leaves. It is pointed out, however, that at low energies, 0.5–5 keV for 4He, preferential neutralization of ions which penetrate beyond the surface has been inferred from electrostatic analyzer data.


Silicon Surface Incident Energy Gold Surface Medium Energy Polycrystalline Gold 
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  1. [1]
    T. M. Buck, G. H. Wheatley, L. C. Feldman, Surface Sci. 35, 345 (1973).ADSCrossRefGoogle Scholar
  2. [2]
    B. A. Trubnikov and Y. N. Yavlinskii, Soviet Phys., JETP 25, 1089 (1967).ADSGoogle Scholar
  3. [3]
    W. Brandt and R. Sizmann, Phys. Letters 37A, 115 (1971).ADSGoogle Scholar
  4. [4]
    D. P. Smith, J. Appl. Phys. 38, 340 (1967).ADSCrossRefGoogle Scholar
  5. [5]
    D. P. Smith, Surface Sci. 25, 171 (1971).ADSCrossRefGoogle Scholar
  6. [6]
    D. J. Bail, T. M. Buck, D. MacNair, and G. H. Wheatley, Surface Sci. 30, 69 (1972).ADSCrossRefGoogle Scholar
  7. [7]
    G. H. Wheatley and C. W. Caldwell, Rev. Sci. Inst. 44, 744 (1973).ADSCrossRefGoogle Scholar
  8. [8]
    R. Lieberman and D. L. Klein, J. Electrochem. Soc. 113, 956 (1966).CrossRefGoogle Scholar
  9. [9]
    J. A. Phillips, Phys. Rev. 97, 404 (1955).ADSCrossRefGoogle Scholar
  10. [10]
    C. F. Barnett and P. M. Stier, Phys. Rev. 109, 385 (1958);ADSCrossRefGoogle Scholar
  11. [10a]
    P. M. Stier and C. F. Barnett, Phys. Rev. 103, 896 (1956).ADSCrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media New York 1975

Authors and Affiliations

  • T. M. Buck
    • 1
  • L. C. Feldman
    • 1
  • G. H. Wheatley
    • 1
  1. 1.Bell LaboratoriesMurray HillUSA

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