Low Inductance Energy Storage and Switching for Plasma Production
Most of the recent advances in pulse power have been driven by increased interest in power supplies to drive large pulsed plasma devices. Brief descriptions of such plasma devices as are being used in our laboratory are given. A more detailed description of the power supplies being developed is given with particular emphasis on design and switching.
KeywordsFull Width Half Maximum Capacitor Bank Pulse Plasma Plasma Device Dense Plasma Focus
Unable to display preview. Download preview PDF.
- 2.Johnson, D.J. and Clark, J.G., AFWLTR-72–31, “(U) Spectral Tailoring of a Dense Plasma Focus”, (1972). classified internal report.Google Scholar
- McCann, T.E., Payton, D.N. and Rogers, C.W., Bull. Amer. Phys. Soc., Ser. II, 17, 690 (1972).Google Scholar
- 4.Johnson, D.J., Ibid.Google Scholar
- 6.Shattas, R., Stettler, J., Roberts, T.E. and Meyer, H.C., “Fusion Neutron and Soft X-ray Generation in Laser Assisted Dense Plasma Focus”, Presented at the 2nd workshop on Laser Interaction and Related Plasma Phenomena, (Aug 30 - Sept 3, 1971 ).Google Scholar
- 7.Hoeberling, R., Private Communication, (1974).Google Scholar
- 8.Field Emission Corporation, model FX-100 operates at 6 MeV, 100 kA, 100 ns FWHM. Model FX-25 operates at 2.5 MeV, 25 kA, 30 ns FWHM.Google Scholar
- 10.Champney, P.D’A, “Some Recent Advances in Three Electrode, Field Enhanced Triggered Gas Switches”, Inter-Conference on Energy Storage Compression, and Switching, Asti, Italy, (Nov 5–7, 1974 ).Google Scholar