Advertisement

Ionized-Cluster Beam Deposition

  • T. Takagi
  • I. Yamada
  • K. Yanagawa

Abstract

A new deposition technique has been developed by using “Vapou-rized-Metal Cluster Ion Source” by authors. This new technique may be named “Ionized-Cluster Beam Deposition”. The fundamental effects of the formation of deposited films such as surface cleaning, deep etching, local heating, and ion implantation effects by injecting cluster ions have been studied. This technique is the one of the special case of simultaneous operation method of implantation and deposition which is proposed by author. By the technique, not only metals but also insulating materials can be depsited on metal substrates or insulating substrates with fairly strong adhesion and in good crystalline state.

Keywords

Strong Adhesion High Deposition Rate Neutral Cluster Beam Deposition Deep Etching 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1).
    T. Takagi, I. Yamada, M. Kunori and S. Kobiyama, Proc. of the Second International Conference on Ion Sources (SGAE, Vienna, Sept., 1973) p.790.Google Scholar
  2. 2).
    T. Takagi, I. Yamada, M. Kunori and S. Kobiyama, Presented at the Sixth International Vacuum Congress, Kyoto, March, 1974.Google Scholar

Copyright information

© Plenum Press, New York 1975

Authors and Affiliations

  • T. Takagi
    • 1
  • I. Yamada
    • 1
  • K. Yanagawa
    • 1
  1. 1.Department of ElectronicsKyoto UniversityKyotoJapan

Personalised recommendations