Ionized-Cluster Beam Deposition
A new deposition technique has been developed by using “Vapou-rized-Metal Cluster Ion Source” by authors. This new technique may be named “Ionized-Cluster Beam Deposition”. The fundamental effects of the formation of deposited films such as surface cleaning, deep etching, local heating, and ion implantation effects by injecting cluster ions have been studied. This technique is the one of the special case of simultaneous operation method of implantation and deposition which is proposed by author. By the technique, not only metals but also insulating materials can be depsited on metal substrates or insulating substrates with fairly strong adhesion and in good crystalline state.
KeywordsStrong Adhesion High Deposition Rate Neutral Cluster Beam Deposition Deep Etching
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