Electron and Ion Beam Microfabrication of Integrated Optic Elements

  • E. D. Wolf


This lecture dealt with various aspects of electron and ion beam microfabrication of prototype structures suitable for light guiding and coupling. The introductory material on electron and ion beam interactions with solid surfaces was not reproduced here because these subjects have been discussed extensively in the literature. The intent of these notes is to provide the reader with some of the more recent techniques and successes of beam micro-fabrication of integrated optics elements.


Electron Beam Polymethyl Methacrylate Waveguide Structure Thin Film Material Electron Beam Exposure 
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  1. 1.
    F. S. Ozdemir, E. D. Wolf, and C. R. Bucky, “Computer-Controlled Scanning Electron Microscope System for High-Resolution Microelectronic Pattern Fabrication,” IEEE Transactions on Electron Devices ED-19, 624–628 (May 1972).CrossRefGoogle Scholar
  2. 2.
    E. D. Wolf, F. S. Ozdemir, and R. D. Weglein, “Precision Electron Beam Microfabrication of Acoustic Surface Wave Devices,” Invited Paper (Jl), Presented at the 1973 IEEE Ultrasonics Symposium Monterey, California, Nov. 5–7, 1973.Google Scholar
  3. 3.
    More than 25 papers on electron beam systems and microfabrication applications are contained in the Proceedings of the 12th Symposium on Electron, Ion, and Laser Beam Technology, E. D. Wolf, Special ed., J. Vac. Sci. Technol. Vol 10, No. 6, Nov./Dec. 1973.Google Scholar
  4. 4.
    E. D. Wolf, F. S. Ozdemir, W. E. Perkins, and P. J. Coane, “Response of the Positive Electron Resist Elvacite 204l to Kilovolt Electron Beam Exposure,” in Rec. 11th Symp. Electron, Ion, and Laser Beam Technol., R. F. M. Thornley, ed., San Francisco, Calif., San Francisco Press, pp. 331–336, 1971.Google Scholar
  5. 5.
    M. Hatzakis, “Electron Resists for Microcircuit and Mask Production,” J. Electrochem. Soc. 110, 1033–1037 (1969).CrossRefGoogle Scholar
  6. 6.
    D. B. Ostrowsky and J. C. DuBois, “Electron Beam Masking for Optical Waveguide Fabrication,” Digest of the Optical Society of America Topical Meeting on Integrated Circuits (Optical Society of America, Washington, D.C., 1972), p. MB7.Google Scholar
  7. 7.
    M. Hatzakis, S. Magdo and C. H. Ting, “Electron Beam Fabrication of Micron Transistors,” Proceedings of 4th International Conference Electron and Ion Beam Science and Technology, Los Angeles, California, May 1970, p. 524–530.Google Scholar
  8. 8.
    J. E. Goell, Digest of the Optical Society of America Topical Meeting on Integrated Circuits (Optical Society of America, Washington, D.C., 1972, p. MB8,Google Scholar
  9. 8a.
    8a.J. E. Goell, R. D. Standley, “Ion Bombardment Fabrication of Optical Waveguides Using Electron Resist Masks,” Appl. Phys. Lett. 21, 72–73 (1972).ADSCrossRefGoogle Scholar
  10. 9.
    S. Somekh, E. Garmire, A. Yariv, H. L. Garvin, and R. G. Hunsperger, Appl. Phys. Lett. 22, 46 (1973).ADSCrossRefGoogle Scholar
  11. 10.
    H. L. Garvin, “High Resolution Fabrication by Means of Ion Beam Sputtering,” Paper Presented at Kodak Microelectronics Seminar, San Diego, Calif., December 11–12, 1972.Google Scholar
  12. 11.
    E. H. Hasseltine, F. C. Hurlbut, N. T. Olson, and H. P. Smith, “Cesium Ion Bombardment of Al2O3 in a Controlled Oxygen Environment,” J. Appl. Phys. 38, 4313 (1967).ADSCrossRefGoogle Scholar
  13. 12.
    M. Marcal, Thomson CSF, France, Private Communication.Google Scholar
  14. 13.
    The results reported here were obtained from work supported in part by the Naval Electronics Laboratory Center, Contract N00123–73-C-0231.Google Scholar
  15. 14.
    E. D. Wolf, “Computer-Controlled Electron Beam Microfabrication,” Invited Paper in Proceedings Seventh National Conference on Electron Probe Analysis, San Francisco, Calif., July 17–21, 1972, p. 24A-24B.Google Scholar
  16. 15.
    H. L. Garvin, E. Garmire, S. Somekh, H. Stoll, and A. Yariv, “Ion Beam Micromachining of Integrated Optics Components,” Appl. Optics 12, 455–459 (1973).ADSCrossRefGoogle Scholar
  17. 16.
    J. P. Auton, Appl. Opt. 6, 1023 (1967).ADSCrossRefGoogle Scholar
  18. 17.
    H. L. Garvin and J. E. Kiefer, “Wire-Grid Polarizers for 10.6 p.m. Radiation,” Digest of Technical Papers 1973 IEEE/IOA Conference on Laser Engineering and Applications, Washington, D.C., May 30-June 1, 1973, Paper 20.9 p. 100.Google Scholar

Copyright information

© University of California 1974

Authors and Affiliations

  • E. D. Wolf
    • 1
  1. 1.Hughes Research LaboratoriesMalibuUSA

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