Blistering of Niobium Due to Low Energy Helium Ion Bombardment Investigated by Rutherford Backscattering

  • J. Roth
  • R. Behrisch
  • B. M. U. Scherzer


Radiation damage and blister formation in a Nb single crystal due to room temperature bombardment with 2–4 keV He ions has been investigated by Rutherford backscattering in double aligned technique (<100>/(111) and<111>/<111>) of 150 keV protons. By this technique it is possible to observe in situ the development of blisters. The critical ion dose for blister formation is about 1017 He+ /cm2 increasing with energy. It is higher for He bombardment in aligned than in random directions. The mean thickness of the cover of the blisters increases from 234Å at 2 keV to 420Å at 4 keV He bombardment in random direction. The average blister size as measured in the SEM was 600Å at 2 keV and 1400Å at 4 keV random bombardment. In <100> aligned bombardment it increases by roughly a factor of 2. The results of our backscattering measurements before the appearance of blisters may be interpreted by the assumption that small Helium bubbles are formed at the penetration depth of the He ions. The measured penetration depth is considerably larger than predicted by theory (Schiøftt).


Random Direction Rutherford Backscattering Blister Formation Damage Production Random Spectrum 
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Copyright information

© Plenum Press, New York 1974

Authors and Affiliations

  • J. Roth
    • 1
  • R. Behrisch
    • 1
  • B. M. U. Scherzer
    • 1
  1. 1.Max-Planck-Institut für PlasmaphysikEURATOM AssociationGarchingGermany

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