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Ion Implantation Effects in Superconducting Niobium Thin Films

  • P. Crozat
  • R. Adde
  • J. Chaumont
  • H. Bernas
  • D. Zenatti

Abstract

Critical temperatures and normal resistances were measured on thin niobium films after implantation of N, O, Nb and Er ions at doses ranging from 1013 to 1017 ions/cm2. Radiation damage and magnetic impurity effects are presented.

Keywords

Critical Temperature Film Resistance Normal Resistance Thin Film Resistance Niobium Thin Film 
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References

  1. 1.
    R. Adde, P. Crozat, S. Gourrier, G. Vernet, M. Bernheim, D. Zenatti, Rev. Phys. Appliquée, Oct. 1973 (in press).Google Scholar
  2. 2.
    Chaumont J. et al., 3d Int. Conf. Appl. Vac. Techn. Suppl. Le Vide, 52, 105 (1971).Google Scholar

Copyright information

© Plenum Press, New York 1974

Authors and Affiliations

  • P. Crozat
    • 1
  • R. Adde
    • 1
  • J. Chaumont
    • 1
  • H. Bernas
    • 1
  • D. Zenatti
    • 2
  1. 1.Institut d’Electronique Fondamentale, Centre de Spectrométrie de Masse (CNRS), and Institut de Physique NucléaireUniversité Paris SudOrsayFrance
  2. 2.Centre d’Etudes Nucléaires, DINRGrenobleFrance

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