Ion Implantation Effects in Superconducting Niobium Thin Films
Critical temperatures and normal resistances were measured on thin niobium films after implantation of N, O, Nb and Er ions at doses ranging from 1013 to 1017 ions/cm2. Radiation damage and magnetic impurity effects are presented.
KeywordsCritical Temperature Film Resistance Normal Resistance Thin Film Resistance Niobium Thin Film
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