Changes in the Electrical Properties of Thin Anodic TiO2 Films Induced by Ion Implantation

  • N. W. Suffield
  • G. Dearnaley
Part of the The IBM Research Symposia Series book series (IRSS)


Various ions, mostly of metal species, were implanted into titanium samples, which were subsequently anodized. A gold electrode was deposited on the surface, and current-voltage measurements were made. The impurities introduced by ion implantation had a major effect upon the electrical behaviour and the relative stability of three distinguishable impedance states. The effects were correlated with the electronegativity of the impurity, and it is concluded that the outward migration of oxygen ions is responsible for ‘forming’ and eventual breakdown.


Pure Titanium Electrical Behaviour Titanium Sample Negative Resistance Outward Migration 
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Copyright information

© Plenum Press, New York 1973

Authors and Affiliations

  • N. W. Suffield
    • 1
  • G. Dearnaley
    • 1
  1. 1.AEREHarwellEngland

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