Off-Line Quality Control in Integrated Circuit Fabrication using Experimental Design
This paper describes and illustrates the off-line quality control method, which is a systematic method of optimizing a production process. It also documents our efforts to optimize the process for forming contact windows in 3.5-μm technology complementary metal-oxide semiconductor (CMOS) circuits fabricated in the Murray Hill Integrated Circuit Design Capability Laboratory (MH ICDCL). Here, by optimization we mean minimizing the process variance while keeping the process mean on target.
KeywordsWindow Size Line Width Spin Speed Orthogonal Array Design Contact Window
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