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Off-Line Quality Control in Integrated Circuit Fabrication using Experimental Design

  • M. S. Phadke
  • R. N. Kackar
  • D. V. Speeney
  • M. J. Grieco
Chapter

Abstract

This paper describes and illustrates the off-line quality control method, which is a systematic method of optimizing a production process. It also documents our efforts to optimize the process for forming contact windows in 3.5-μm technology complementary metal-oxide semiconductor (CMOS) circuits fabricated in the Murray Hill Integrated Circuit Design Capability Laboratory (MH ICDCL). Here, by optimization we mean minimizing the process variance while keeping the process mean on target.

Keywords

Window Size Line Width Spin Speed Orthogonal Array Design Contact Window 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© AT&T 1989

Authors and Affiliations

  • M. S. Phadke
  • R. N. Kackar
  • D. V. Speeney
  • M. J. Grieco

There are no affiliations available

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