Advertisement

Particulate Contamination on Wafer Surfaces Resulting from Hexamethyldisilazane/Water Interactions

  • M. A. Logan
  • D. L. O’Meara
  • J. R. Monkowski
  • H. Cowles

Abstract

A major step in the photolithographic processing of silicon wafers is the application of hexamethyldisilazane (HMDS) as a photoresist adhesion agent. At this time the preferred application technique is one known as vapor priming. In the vapor prime system, the silicon wafers are heated in a vacuum oven, where they are exposed to vapors of HMDS which are pulled from a container of the HMDS liquid. In vapor prime systems as they are presently configured, there is significant opportunity for contamination by atmospheric moisture. HMDS is known to be hygroscopic and to react with moisture to form ammonia and other reaction products. For the most part, the major result ascribed to this reaction has been a degradation of the adhesion promotion properties of the HMDS. In this investigation, however, we have looked at particulate contamination generated’by the HMDS/H2O interaction. A model is proposed to describe the in-situ generation of particles from an HMDS/H2O reaction, and considerations for minimizing contamination in an HMDS vapor prime system are discussed.

Keywords

Silicon Wafer Auger Electron Spectroscopy Wafer Surface Atmospheric Moisture Hydrolytic Cleavage 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    K.L. Mittal, Solid State Technology, 22 (5), 89 (1979).Google Scholar
  2. 2.
    R.O. Sauer, J. Am. Chem. Soc., 66, 1707 (1944).CrossRefGoogle Scholar
  3. 3.
    R.H. Krieble and J.R. Elliot, J. Am. Chem. Soc., 68, 229 (1946).CrossRefGoogle Scholar
  4. 4.
    M.A. Logan, D.L. O ’ Meara, and J.R. Monkowski, Proceedings of the Microcontamination Conference and Exposition, pp. 111–122, Canon Communications, Santa Monica, CA (1986).Google Scholar

Copyright information

© Plenum Press, New York 1988

Authors and Affiliations

  • M. A. Logan
    • 2
  • D. L. O’Meara
    • 1
  • J. R. Monkowski
    • 2
  • H. Cowles
    • 3
  1. 1.J.C. Schumacher CompanyCarlsbadUSA
  2. 2.Monkowski-Rhine, IncorporatedSan DiegoUSA
  3. 3.Great Western SiliconChandlerUSA

Personalised recommendations