Cleaning Semiconductor Surfaces: Facts and Foibles

  • Arvind Khilnani

Abstract

This paper is intended as a brief description of the fundamentals of cleaning and monitoring surfaces in the semiconductor industry. First a brief review of why cleaning is important in semiconductor manufacturing is presented. Next, a brief description of the contaminants and their sources is presented. Finally, how the wafers are cleaned is discussed. Anomalies in cleaning methods, pertinent to the semiconductor industry, are highlighted along the way.

Keywords

Adhesion Force Wafer Surface Semiconductor Industry Cleaning Method High Temperature Operation 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1988

Authors and Affiliations

  • Arvind Khilnani
    • 1
  1. 1.Institute for the FutureMenlo ParkUSA

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