Advertisement

Electrostatic Charge Generation on Wafer Surfaces and its Effect on Particulate Deposition

  • Mark Blitshteyn
  • Angel Martinez

Abstract

Semiconductor fabrication processes involving contact and separation of processing media with wafer surfaces can leave a wafer electrostatically charged. It was shown theoretically that the electrostatic charge may have an effect on the rate of particle deposition on exposed wafer surfaces. In this paper the results of the experimental studies of static charge generation on wafer surfaces and particle deposition on charged wafers in semiconductor manufacturing environment are presented. It was observed that in a very clean environment of the Class 10 cleanroom the effect of electrostatic potentials of up to 6000 volts applied to the wafers on the rate of > 1 µm particle deposition on the wafer surfaces could not be demonstrated, while the effect was statistically significant in a less clean environment of the Class 10,000 cleanroom.

Keywords

Electrostatic Potential Particle Deposition Wafer Surface Electrostatic Charge Bare Silicon Wafer 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    B.Y.H. Liu, presented to the 32nd Annual Meeting of the Institute of Environmental Sciences, Dallas, 1986.Google Scholar
  2. 2.
    M. Yost and A. Steinman, Microcontamination, June 1986, p.18.Google Scholar
  3. 3.
    M. Blitshteyn, Evaluation Engineering, November, 1984, p.70.Google Scholar
  4. 4.
    B. J. Tullis, Microcontamination, December 1985, p.14.Google Scholar
  5. 5.
    J.C.R. Li, “Statistical Inference”, Vol.1, Edwards Brothers, Inc., Ann Arbor, Michigan, 1964.Google Scholar
  6. 6.
    B.A. Unger, R.G. Chemelli, and P.R. Bossard, presented at the 1984 EOS/ESD Symposium.Google Scholar
  7. 7.
    W.G. Cochran and G.M. Cox, “Experimental Design Second Edition”, John Wiley and Sons, New York, 1957, pp.117 -127.Google Scholar

Copyright information

© Plenum Press, New York 1988

Authors and Affiliations

  • Mark Blitshteyn
    • 1
  • Angel Martinez
    • 2
  1. 1.The Simco Company, Inc.HatfieldUSA
  2. 2.Advanced Micro DevicesSunnyvaleUSA

Personalised recommendations