Abstract
In chapter 2, deflections systems were briefly described in differential form. Here they are given a finite element formulation. The following section is based upon two papers by Munro and Chu on magnetic and electrostatic deflectors [1], and the work of Lencová [2]. The accuracy of the finite element method for deflectors will then be examined on some simple test examples. Much of the work presented in this chapter has been carried out by Zhao [3].
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References
E. Munro, and H.C Chu, “Numerical analysis of electron beam lithography systems. Part I: computation of fields in magnetic deflectors”, Optik, 60, pp.371–390. 1982 and their paper, “Numerical Analysis of Electron beam systems. Part II: Computation of fields in electrostatic deflectors”, Optik, 61,1–16, 1982
Lencová, B., Lenc, M. and van der Mast, K. D. Computation of magnetic deflectors for electron beam lithography. J. Vac. Technol. B, 7, pp.1846–1850, 1989.
Y. Zhao, “The design of In-Lens deflectors for electron beam systems”, PHD thesis, Electrical Engineering Department, National University of Singapore, Singapore 119260, to be published
A. Khursheed, “The Khursheed Electron Optics Software” (KEOS), Department of Electrical Engineering, National University of Singapore, 1998
Y. Zhao, Numerical analysis of deflection systems in CRTs using a combined BEM and FEM method. M.Eng dissertation, Xian Jiaotong Uinversity, 1986
A. Osseyran, “Computer aided design of magnetic deflection systems”, Phillips J. Res. 41, supplement 1, pp.34–36, 54–57. 1986
TOSCA, product of Vector Fields Ltd, 24 Bankside, Kidlington, Oxford OX5 1JE, Endgland, U.K.
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Khursheed, A. (1999). Deflection Fields. In: The Finite Element Method in Charged Particle Optics. The Springer International Series in Engineering and Computer Science, vol 519. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-5201-7_10
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DOI: https://doi.org/10.1007/978-1-4615-5201-7_10
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