Abstract
Metal-organic vapor-phase epitaxy (MOVPE) is today a powerful growth technique, capable of producing high-quality material of virtually all III/V and II/VI semiconductor compounds and ternary and quaternary alloys (for an overview, see, for instance, [1] and the references therein). The importance of MOVPE for mass production has been increasing. In terms of consumption of II/V wafer area, MOVPE is today rated second (20%), after liquid-phase epitaxy (LPE, 55%) and in front of the classical vapor-phase epitaxy (VPE, 18%) and the ultra-high-vacuum (UHV) technology molecular beam epitaxy (MBE, 7%) [2]. With the development of larger reactor cells, simultaneously handling up to about 10–15 2” wafers per growth session, this trend will continue. As a consequence, for the practical realization of quantized structures in future mass production technology, MOVPE will be one of the most important growth technologies. In Section 2 of this chapter, we will briefly discuss some principles and specifics of MOVPE, in particular from the perspective of growth on a scale of nanometers.
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Seifert, W. (2000). The use of MOVPE to produce quantum structured semiconductors. In: Pearsall, T.P. (eds) Quantum Semiconductor Devices and Technologies. Electronic Materials Series, vol 6. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-4451-7_4
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DOI: https://doi.org/10.1007/978-1-4615-4451-7_4
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