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Industrial Applications of Surfactants, and Surfactants in Emerging Technologies

  • Chapter
Surfactants in Solution

Abstract

Surface sizing generally refers to the process of imparting paper resistance to wetting by liquid through the surface modification of paper. In this study, the interfacial phenomena in surface sizing were examined by considering the penetration of liquid into the porous structure of paper. By modifying Fowkes’ original study on the work of adhesion [F.M. Fowkes, Ind. Eng. Chem..56, no.12,40 (1964)] and Washburn-Lucas model [E.W. Washburn, Phys. Rev., 17,273 (1921); R. Lucas, Kolloid-Z, 21,15 (1918)] on capillary penetration, a theoretical framework on the penetration of liquid into surface-sized substrate is presented. Theoretical analysis was made to determine the criteria and governing factors in developing the resistance to polar and nonpolar liquids. The authors gratefully acknowledge the support of the management of PPG Industries for this work.

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Authors and Affiliations

  1. Chemical Group Technical Center, PPG Industries, Inc., 440 College Park Drive, Monroeville, PA, 15146, USA

    M. J. Hou & Sai H. Hui

  2. Betz PaperChem, Inc., 7510 Baymeadows Way, Jacksonville, FL, 32256, USA

    F. F. Ling, T. D. Hancock & C. R. Olson

  3. Department of Chemistry, Clarkson University, Potsdam, NY, 13676, USA

    S. E. Friberg & M. Chiu

  4. Department of Mechanical Engineering, University of Michigan, Ann Arbor, MI, 48109, USA

    K. Ludema

  5. Clorox Technical Center, Pleasanton, CA, 94588, USA

    Paul F. Reboa

  6. ILL, 156X 38042, Grenoble Cedex, France

    P. Terech

  7. Sun Chemical Corporation, 631 Central Avenue, Carlstadt, NJ, 07072, USA

    R. Krishnan & R. W. Bassemir

  8. Faculty of Textile Science and Technology, Shinshu University, Uedashi, Nagano-ken, Japan

    M. Mitsuishi, T. Yagi, T. Ishiwatari, K. Hamada & T. Takaoka

  9. Department of Chemistry & Applied Chemistry, University of Salford, Salford, UK

    R. Palepu, D. G. Hall & E. Wyn-Jones

  10. ICI Agrochemicals, Jealotts Hill Research Station, Bracknell, Berks, RG12 6EY, UK

    Th. F. Tadros

  11. 12 West 72nd Street, New York, NY, 10023, USA

    M. J. Schick (Consultant)

  12. Central Research, Ciba-Geigy Corp., Ardsley, NY, 10502, USA

    Geoffrey Christ & Chang Jho

  13. Alcoa Laboratories, Aluminum Company of America, Alcoa Center, PA, 15069, USA

    G. Biresaw, R. A. Reich, R. Y. Leung, J. Bohaychick, R. P. Festa & D. A. Zadnik

  14. Department of Chemistry, National Tsing Hua University, Hsinchu, 30043, Taiwan, Republic of China

    S.-D. Huang, J.-Y. Huang, M.-H. Cheng & G.-L. Sheu

  15. Department of Applied Chemistry, Indian School of Mines, Dhanbad, 826004, India

    N. S. Rawat

  16. Central Fuel Research Institute, Jealgora, Dhanbad, India

    Sisir Kumar Roy

  17. Dept. of Chemical Engineering, Tulane University, New Orleans, LA, 70118, USA

    H. Nguyen, M. Rao, J. B. Phillips & V. T. John

  18. Langmuir Center for Colloids and Interfaces, Henry Krumb School of Mines, Columbia University, New York, NY, 10027, USA

    C. A. Malbrel & P. Somasundaran

  19. GBF Gesellschaft fur Biotechnologische Forschung Downstream Processing, Mascheroder Weg 1, 3300, Braunschweig, West Germany

    G. A. Krei & H. Hustedt

  20. Department of Chemistry, Banaras Hindu University, Varanasi, 221005, India

    R. C. Srivastava

  21. Chemistry Department, Jadavpur University, Calcutta, India

    Mausumi Mukhopadhyay, Anupa Guha Majumdar & Asok K. Jana

  22. Department of Chemical Engineering, University of Rhode Island, Kingston, RI, 02881, USA

    Suhas Bhandarkar & Arijit Bose

  23. Department of Applied Chemistry and Engineering Research, Ningbo University, Ningbo, Zhejiang, China

    Hu Jie, Qi Wen-Bin & Pu Bin-Yin

  24. Universität Siegen, Physikalische Chemie, D-5900, Siegen, Germany

    Thomas Wolff, Bernhard Klaußner & Günther von Bünau

  25. Department of Chemical Engineering, University of Illinois, Chicago, 60680, USA

    P. Kumar

  26. Department of Chemical Engineering and Center for Surface Science and Engineering, University of Florida, Gainesville, FL, 32611, USA

    P. Ayyub, A. Maitra & D. O. Shah

  27. Center of Physical Chemistry, ICECHIM, Spl. Independentei 202, 79611, Bucharest, Romania

    Gh. Nechifor, Mariane Nechifor, Georgeta Popescu & B. Albu

  28. Chemistry Department, Nagpur University, Nagpur, 440 010, India

    A. S. Mahakalkar & K. N. Munshi

  29. Indian School of Mines, Dhanbad, 826 004, India

    D. R. Sinha & D. Guha

  30. Chemistry Department, University of Natal, King George V Avenue, Durban, 4001, South Africa

    C. E. Rutherford & L. F. Salter

  31. Department of Chemical Engineering, Auburn University, Auburn, AL, 36849, USA

    Sang Joon Park & Ronald D. Neuman

  32. Chemical Engineering Department, Case Western Reserve University, Cleveland, OH, 44106, USA

    Syed Qutubuddin & P. Kayima

  33. Chemistry Department, Jadavpur University, Calcutta, 700032, India

    Benoy B. Bhowmik, Chirasree Sen-Varma, Ira Chatterjee & Sharmila Bhattacharya

  34. Depto. Ingenieria Quimica y del Medio Ambiente, Universidad del Pais Vasco, Spain

    Angel Valea Perez & M. L. Gonzalez Arce

  35. Universitaria de Ingenieria Tecnica Industrial, Plaza de la Casilla, 3, 48012, Bilbao, Spain

    Angel Valea Perez & M. L. Gonzalez Arce

  36. Chemistry Department, Obafemi Awolowo University, Ile-Ife, Nigeria

    O. A. Amire

  37. Laboratorium voor Moleculaire Dynamica en Spectroscopie KULeuven, Celestijnenlaan 200 F, B-3030, Leuven, Belgium

    M. Van der Auweraer & F. C. De Schryver

Authors
  1. M. J. Hou
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  2. Sai H. Hui
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  3. F. F. Ling
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  4. T. D. Hancock
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  5. C. R. Olson
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  6. S. E. Friberg
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  7. M. Chiu
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  8. K. Ludema
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  9. Paul F. Reboa
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  10. P. Terech
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  13. M. Mitsuishi
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  18. R. Palepu
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  23. Th. F. Tadros
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  24. M. J. Schick
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  25. Geoffrey Christ
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  26. Chang Jho
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  27. G. Biresaw
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  28. R. A. Reich
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  29. R. Y. Leung
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  30. J. Bohaychick
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  31. R. P. Festa
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  32. D. A. Zadnik
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  33. S.-D. Huang
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  34. J.-Y. Huang
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  36. G.-L. Sheu
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  37. N. S. Rawat
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  38. Sisir Kumar Roy
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  39. H. Nguyen
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  40. M. Rao
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  78. Chirasree Sen-Varma
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  80. Sharmila Bhattacharya
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  81. Angel Valea Perez
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Editor information

Editors and Affiliations

  1. IBM US Technical Education, Thornwood, New York, USA

    K. L. Mittal

  2. University of Florida, Gainesville, Florida, USA

    D. O. Shah

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© 1991 Springer Science+Business Media New York

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Hou, M.J. et al. (1991). Industrial Applications of Surfactants, and Surfactants in Emerging Technologies. In: Mittal, K.L., Shah, D.O. (eds) Surfactants in Solution. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3836-3_49

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  • DOI: https://doi.org/10.1007/978-1-4615-3836-3_49

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4613-6712-3

  • Online ISBN: 978-1-4615-3836-3

  • eBook Packages: Springer Book Archive

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