Abstract
Non thermal plasmas such as those generated by DC or RF glow discharges are attractive for plasma chemistry due to their ability to achieve high temperature chemistry at low gas temperature. In DC or RF glow discharges, the electrons carry the energy which is necessary to excite, dissociate or ionize the gas molecules and to create reactive species. The resulting plasma can be chemically reactive both in the gas phase and with the surfaces exposed to it. An important application of reactive plasma concerns the microelectronics industry and is related to VLSI (very large scale integration) processing.
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References
Barnes M.S., Cotler T.J. and Elta M.E., 1987, J.Appt. Phys. 61, 81
Boeuf J.P. and Marode E., 1982, J. Phys. D: Appl. Phys. 15, 2169
Boeuf J.P., 1987, Phys. Rev. A 36, 2782
Boeuf J.P., 1988, J. Appl. Phys. 63, 1342
Boeuf J.P. and Ségur P.S., 1988, in “Interactions Plasma Froids Materiaux”, ed. by C. Lejeune, GRECO 57 CNRS, Les Editions de Physique, p. 113.
Bletzinger P. and Flemming M.J., 1987, J. Appl. Phys. 62, 4688
Boswell R.W, and Morey I.J., 1988, J. Appl. Phys. 52, 21
Capitelli M., Gorse C. and Ricard A., 1981, J. Physique 42,469.
Capitelli M., Gorse C., Winkler R. and Wilhelm J., 1988, Plasma Chem. Plasma Process. 8,399.
Chapman B., 1980 ‘Glow Discharge Processes’, (John Wiley and Sons: New York)
Coburn J.W. and Kay E., 1972, J. Appl. Phys. 43, 4965
Derouard J., Debontride H. and Sadeghi N., 1987, J, Physique 48, Colloque C7, 725; see also Derouard J., 1989, this volume
Ferreira C.M. and Loureiro J., 1989, J. Phys. D 22 76
Flamm D.L. and Donnelly V.M., 1986, J. Appl. Phys. 59, 1052
Godyak V.A. and Kanneh A.S., 1986, IEEE Trans. Plasma Sc. PS-14, 112
Godyak V.A., 1986, “Soviet Radio Frequency Discharge Research”,(Delphic Asociates)
Goedde C.G., Lichtenberg A.J., Lieberman, 1988,J. Appl. Phys. 64, 4375
Gogolides E., Nicolai J.P. and Sawin H.H., 1988, Proc. of the 41St GEC, Minneapolis, Minnesota, p 141
Gogolides E., Nicolai J.P. and Sawin H.H., to be published, 1989, “Comparisons of experimental measurements and model predictions for RFSF6 discharges”
Gottscho R.A., Burton R.H., Flamm D.L., Donnelly V.M., and Davis G.P., 1984, J. Appl. Phys. 55, 2707
Gottscho R.A. and Gaebe C.E., 1986,IEEE Trans. Plasma Science PS-14,92
Gottscho R.A., 1987, Phys. Rev. A 36, 2233
Gottscho R.A., Mitchell A., Scheller G.R., Schryer G.R., Graves D.B. and Boeuf J.P., 1988, Proc.7th Symp. Plasma Proc. Electrochem. Soc., G.S. Mathad, G.C. Schwartz and D.W. Hess
Graves D.B. and Jensen K.F., 1986, IEEE trans. Plasma Science PS-14 78
Graves D.B. 1987, J. Appl. Phys. 62, 88
Gummel H.K., 1964, IEEE Trans. Electron Devices ED-30, 1097
Hebner G.A. and Verdeyen J.T.,1986,IEEE Trans. Plasma Science PS14, 132
Hebner G.A., Verdeyen J.T., Kushner M.J.,1988, J. Appl. Phys. 63, 2226
Keller J.H. et Pennebaker W.B., 1970, IBM J. Res. Dev. 14, 168
Kitamori K. and Tagashira T.,1988, Proc. of the 9th ESCAMPIG, Lisbon,Portugal, Ed. C.M. Ferreira, (European Physical Society), p 277
Kline L.E., Partlow W.D. and Bies W.E., 1989, J. Appl. Phys. 65, 70
Koenig H.R. and Maissel L.I., 1970, IBM J. Res. Develop. 14, 168
Köhler K., Coburn J.W., Horne D.E., Kay E.,1985a,Appl. Phys. 57, 59
Köhler K., Horne D.E. and Coburn J.W., 1985b, J. Appl. Phvs. 58, 3350
Kurata M., “Numerical Analysis for Semiconductor Devices”, D.C. Heath and Company, (Lexington Mass 1982)
Kushner M.J., 1983, J. Appl. Phys. 54 4958
Kushner M.J., 1986, IEEE Trans. Plasma Science PS14, 188
Levitskii S.M., 1958, Sov. Phys. Tech. Phys. 2, 887
Logan J.S., Keller J.H., Simmons R.G.,1977,J.Vac.Sci.Technol. 14, 92
Makabe T., 1988, Proc. of the 9th ESCAMPIG, Lisbon, Portugal, Ed. C.M. Ferreira, (European Physical Society), p 277
Metze A., Ernie D.W. and Oskam H.J., 1986, J. Appl. Phys. 60, 3081
Moratz T.J., Pitchford L.C. and Bardsley J.N., 1987, J. Appl. Phys. 61, 2146
Paranjpe A.P., Mc Vittie J.P. and Self S.A., 1988, Proc. of the 41st GEC, Minneapolis, Minnesota, p 45
Pennebaker W.B., (1979), IBM J. Res. Dev. 23, 3
Perrin J., Roca i Cabarrocas P., Allain B. and Friedt J.M., 1988, Jap. J. Appl. Phys. 2041
Phelps A.V. et Pitchford L.C., (1985) Phys. Rev. A31, 2932
Phelps A.V., Jelenkovic B.M. and Pitchford L.C., 1987, Phys. Rev. A 36, 537
Pointu A.M., 1986, J. Appl. Phys. 60, 12 4113
Popov O.A. and Godyak V.A., 1985, J. Appl. Phys. 57, 53
Richards A.D., Thompson B.E. and Sawin H.H., 1987a, Appl. Phys.Lett. 50, 492
Richards A.D., Thompson B.E., Allen K.D. and Sawin H.H., 1987b, L Appl. Phys. 62, 792
Riemann, K.U., 1989, J. Appl. Phys. 65, 999
Rogoff G.L., Kramer J.M. and Piejak R.B., 1986, IEEE Trans. Plasma Science PS-14, 103
Sato N. and Tagashira H., 1985, J. Phys. D 18, 2451
Selberherr S. and Ringhofer C.A., 1984, IEEE Trans. Computer-Aided Design CAD-3, 52
Ségur P., Yousfi M., Boeuf J.P., Marode E., Davies A.J. et Evans J.G.,1983, in ‘Electrical Breakdown and Discharges in Gases’, NATO ASI series 89a, Eds E.E. Kunhardt et H.L. Luessen, 331
Sharfetter D.L., Gummel H.K.,1969, IEEE Trans. Electron.Dev. ED-16, 64
Surendra M. and Graves D.B. 1988, Proc. of the 41st GEC, Minneapolis,Minnesota, p 45
Suzuki K., Ninomiyak Nishimatsu S., Thomas J.W. and Steinfeld J.I., 1986, Jap. J. Appl. Phys. 25, 1569
Taillet J., 1968, Am. J. Phys. 37, 423
Thompson B.E., Allen K.D., Richards A.D. and Sawin H.H., 1985, Appl. Phys. 59, 1891
Turban, in “Interactions Plasma Froids Materiaux”, ed. by C. Lejeune, GRECO 57 CNRS, Les Editions de Physique 1988, p. 79.
Van Roosemalen A.J., Van Roosemalen W.G.M., Van den Hoek W.G.M. and Kalter H., 1985, J. Appl. Phys. 58, 653
Vidaud P., Durrani S.M.A. and Hall D.R., 1988„ J. Phys. D 21, 57
Ward A.L., 1962, J. Appl. Phys. 33, 2789
Winkler R., Wilhelm J., et Hess A., (1985) Ann. Phys., Leipz. 42, 537
Zarowin C.B., 1983,J. Electrochem. Soc. 130, 1144
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Boeuf, J.P., Belenguer, P. (1990). Fundamental Properties of RF Glow Discharges: An Approach Based on Self—Consistent Numerical Models. In: Capitelli, M., Bardsley, J.N. (eds) Nonequilibrium Processes in Partially Ionized Gases. NATO ASI Series, vol 220. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3780-9_9
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