Electron - Molecule Collision Cross Sections for Etching Gases
The purpose of this article is twofold. Firstly, we will review the current status of electron - molecule collision cross sections for those etching gases that are most commonly used as the reactive constituents of processing plasmas. This includes a discussion of (1) what are the molecules for which cross section data are needed most urgently and (2) what are the particular cross sections that are needed for the various target molecules. Secondly, we will discuss some specific aspects of dissociative electron collisions with the reactive constituents of processing plasmas, since the dissociation of the feedstock molecules in a discharge mixture induced by electron impact plays a key role in any effort to understand and to model the complex processes in the plasma.
KeywordsProcessing Plasma Emission Cross Section Dissociative Recombination Dissociative Excitation Appearance Potential
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