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Photoresists and Their Development

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Processes in Photoreactive Polymers

Abstract

A review of the chemistry associated with photoresists based on photochemical generation of carboxylic acids from diazoketones and strong Brönsted acids from aromatic onium salts is presented. The mechanisms for changes in dissolution properties for these photopolymers, as well as the underlying photochemistry that initiates these changes, are discussed. The photoinitiator, or photoactive compounds, and the polymers used in photoresists have traditionally been considered as separate entities. Thus the photoinitiator absorbs light and undergoes a chemical reaction that results in a change in dissolution of the photopolymer formulation. This chapter will describe the role of the polymer matrix for the dissolution changes of diazoketone resists and the role of the polymer in the photochemical generation of Brönsted acids from onium salts. It will be shown that the photochemistry and photophysics of both the photoinitiator and the matrix polymer have profound effects on the performance of photoresists.

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Authors
  1. Nigel P. Hacker
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Editors and Affiliations

  1. DSM Desotech, Inc., Elgin, IL, USA

    V. V. Krongauz

  2. Argonne National Laboratory, Argonne, IL, USA

    A. D. Trifunac

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Hacker, N.P. (1995). Photoresists and Their Development. In: Krongauz, V.V., Trifunac, A.D. (eds) Processes in Photoreactive Polymers. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-1767-2_11

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  • DOI: https://doi.org/10.1007/978-1-4615-1767-2_11

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-0-412-03891-4

  • Online ISBN: 978-1-4615-1767-2

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