Abstract
Plasma is seldom used to etch blanket films in microelectronics fabrication. The etching of photoresist and the underlying substrate is also important since the etching selectivity is never infinite and aspect ratio dependent etching often causes some etching of the underlying substrate or thin film.
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© 2003 Springer Science+Business Media New York
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Chen, F.F., Chang, J.P. (2003). Selectivity. In: Lecture Notes on Principles of Plasma Processing. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-0181-7_36
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DOI: https://doi.org/10.1007/978-1-4615-0181-7_36
Publisher Name: Springer, Boston, MA
Print ISBN: 978-0-306-47497-2
Online ISBN: 978-1-4615-0181-7
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