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Plasma Processing

  • Francis F. Chen
  • Jane P. Chang

Abstract

Plasma processing is the most widely used chemical process in microelectronic industry for thin film deposition and etching. Its application extends to surface cleaning and modification, flat panel display fabrication, plasma spary, plasma micro-discharge and many other rapidly growing areas. The fundamental understanding of plasma processes is now sufficient that plasma models are emerging as tools for developing new plasma equipment and process, as well as diagnosing process difficulties. In addition, plasma diagnostics are now being implemented as process monitors, endpoint detectors, and process controllers to improve processing flexibility and reliability.

Keywords

Glow Discharge Plasma Processing Thin Film Deposition High Density Plasma Target Electrode 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Copyright information

© Springer Science+Business Media New York 2003

Authors and Affiliations

  • Francis F. Chen
    • 1
  • Jane P. Chang
    • 2
  1. 1.Electrical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA
  2. 2.Chemical Engineering DepartmentUniversity of CaliforniaLos AngelesUSA

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