Skip to main content

Abstract

A Langmuir probe is small conductor that can be introduced into a plasma to collect ion or electron currents that flow to it in response to different voltages. The current vs. voltage trace, called the Iā€“V characteristic, can be analyzed to reveal information about n, T e, V s (space potential), and even the distribution function f e(v), but not the ion temperature. Since the probe is immersed in a harsh environment, special techniques are used to protect it from the plasma and vice versa, and to ensure that the circuitry gives the correct I ā€“V values. The probe tip is made of a high-temperature material, usually a tungsten rod or wire 0.1ā€“1 mm in diameter. The rod is threaded into a thin ceramic tube, usually alumina, to insulate it from the plasma except for a short length of exposed tip, about 2ā€“10 mm long. These materials can be exposed to low-temperature laboratory plasmas without melting or excessive sputtering. To avoid disturbing the plasma, the ceramic tube should be as thin as possible, preferably < 1 mm in diameter but usually several times this. The probe tip should extend out of the end of the lube without touching it. so that it would not be in electrical contact with any conducting coating that may deposit onto the insulator.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 129.00
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 169.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. H. H. Sawin, Plasma processing for microelectronic fabrication, Lecture notes, MIT (1996).

    Google ScholarĀ 

  2. B. Chapman, Glow discharge processes, Wiley (1980).

    Google ScholarĀ 

  3. M. A. Lieberman and A. J. Lichtenberg, Principles of plasma discharges and materials processing, Wiley (1994).

    Google ScholarĀ 

  4. J. R. Hollahan and A. T. Bell, Fundamentals of plasma chemistry: Techniques and applications of plasma chemistry, Wiley (1974).

    Google ScholarĀ 

  5. J. F. Oā€™Hanlon, A Userā€™s guide to vacuum technology, Wiley (1989).

    Google ScholarĀ 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

Copyright information

Ā© 2003 Springer Science+Business Media New York

About this chapter

Cite this chapter

Chen, F.F., Chang, J.P. (2003). Langmuir Probes. In: Lecture Notes on Principles of Plasma Processing. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-0181-7_12

Download citation

  • DOI: https://doi.org/10.1007/978-1-4615-0181-7_12

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-0-306-47497-2

  • Online ISBN: 978-1-4615-0181-7

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics